Publication
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic
Patrick Naulleau, Patrick Naulleau, Patrick Naulleau, Patrick Naulleau, Kenneth A. Goldberg, Kenneth A. Goldberg, Kenneth A. Goldberg, Kenneth A. Goldberg, Erik H. Anderson, Erik H. Anderson, Erik H. Anderson, Erik H. Anderson, David Attwood, David Attwood, David Attwood, David Attwood, Phillip Batson, Phillip Batson, Phillip Batson, Phillip Batson, Jeffrey Bokor, Jeffrey Bokor, Jeffrey Bokor, Jeffrey Bokor, Paul Denham, Paul Denham, Paul Denham, Paul Denham, Eric Gullikson, Eric Gullikson, Eric Gullikson, Eric Gullikson, Bruce Harteneck, Bruce Harteneck, Bruce Harteneck, Bruce Harteneck, Brian Hoef, Brian Hoef, Brian Hoef, Brian Hoef, Keith Jackson, Keith Jackson, Keith Jackson, Keith Jackson, Deirdre Olynick, Deirdre Olynick, Deirdre Olynick, Deirdre Olynick, Seno Rekawa, Seno Rekawa, Seno Rekawa, Seno Rekawa, Farhad Salmassi, Farhad Salmassi, Farhad Salmassi, Farhad Salmassi, Ken Blaedel, Ken Blaedel, Ken Blaedel, Ken Blaedel, Henry Chapman, Henry Chapman, Henry Chapman, Henry Chapman, Layton Hale, Layton Hale, Layton Hale, Layton Hale, Paul Mirkarimi, Paul Mirkarimi, Paul Mirkarimi, Paul Mirkarimi, Regina Soufli, Regina Soufli, Regina Soufli, Regina Soufli, Eberhard Spiller, Eberhard Spiller, Eberhard Spiller, Eberhard Spiller, Don Sweeney, Don Sweeney, Don Sweeney, Don Sweeney, John Taylor, John Taylor, John Taylor, John Taylor, Chris Walton, Chris Walton, Chris Walton, Chris Walton, Donna O’Connell, Donna O’Connell, Donna O’Connell, Donna O’Connell, Daniel Tichenor, Daniel Tichenor, Daniel Tichenor, Daniel Tichenor, Charles W. Gwyn, Charles W. Gwyn, Charles W. Gwyn, Charles W. Gwyn, Pei-Yang Yan, Pei-Yang Yan, Pei-Yang Yan, Pei-Yang Yan, Guojing Zhang, Guojing Zhang, Guojing Zhang, Guojing Zhang
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2002, American Vacuum Society
DOI: 10.1116/1.1524976
