What is it about?
Hyperbolic metamaterial composed of SiO 2 /Al fi lms are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns.
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Why is it important?
Interference lithography with half pitch 45 nm (≈ λ /8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (≈ λ /16) and variety of BPPs interference patterns are feasible.
Perspectives
It definitely presents that the multifilms can be used to produce deep subwavelength patterns by interferring the evanescent waves.
Gaofeng Liang
Chongqing University
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This page is a summary of: Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography, Advanced Optical Materials, April 2015, Wiley,
DOI: 10.1002/adom.201400596.
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