All Stories

  1. 1300°C Annealing of 1×1020 Al+ Ion Implanted 3C-SiC
  2. Activation Energy for the Post Implantation Annealing of 1019 cm-3 and 1020 cm-3 Ion Implanted Al in 4H SiC
  3. Carrier Transport Mechanisms in Ion Implanted and Highly-Doped p-Type 4H-SiC(Al)
  4. About the Electrical Activation of 1×1020 cm-3 Ion Implanted Al in 4H-SiC at Annealing Temperatures in the Range 1500 - 1950°C
  5. Ni-Al-Ti Ohmic Contacts with Preserved Form Factor and Few 10- 4 Ωcm2 Specific Resistance on 0.1-1 Ωcm p-Type 4H-SiC
  6. 3C-SiС Hetero-Epitaxially Grown on Silicon Compliance Substrates and New 3C-SiС Substrates for Sustainable Wide-Band-Gap Power Devices (CHALLENGE)
  7. Kinetics Modeling of the Carbon Vacancy Thermal Equilibration in 4H-SiC
  8. Double Step Annealing for the Recovering of Ion Implantation Defectiveness in 4H-SiC DIMOSFET
  9. Formation of D-Center in p-Type 4H-SiC Epi-Layers during High Temperature Treatments
  10. Point Defects Investigation of High Energy Proton Irradiated SiC p+-i-n Diodes
  11. DLTS Study on Al+ Ion Implanted and 1950°C Annealed p-i-n 4H-SiC Vertical Diodes
  12. Ni-Al-Ti Ohmic Contacts on Al Implanted 4H-SiC
  13. Al+ Ion Implanted 4H-SiC Vertical p+-i-n Diodes: Processing Dependence of Leakage Currents and OCVD Carrier Lifetimes
  14. Forward Current of Al+ Implanted 4H-SiC Diodes: A Study on Periphery and Area Components
  15. 1950°C Annealing of Al+ Implanted 4H-SiC: Sheet Resistance Dependence on the Annealing Time
  16. High Temperature Variable Range Hopping in Heavy Al Implanted 4H-SiC
  17. Controlling the Carbon Vacancy Concentration in 4H-SiC Subjected to High Temperature Treatment
  18. Formation and Annihilation of Carbon Vacancies in 4H-SiC
  19. Isothermal Treatment Effects on the Carbon Vacancy in 4H Silicon Carbide
  20. SiC Device Manufacturing: How Processing Impacts the Material and Device Properties
  21. Al+ Ion Implanted On-Axis <0001> Semi-Insulating 4H-SiC
  22. About the Hole Transport Analysis in Heavy Doped p-Type 4H-SiC(Al)
  23. Ion Implanted Lateral p+-i-n+ Diodes on HPSI 4H-SiC
  24. Analytical Prediction of the Cross-Over Point in the Temperature Coefficient of the Forward Characteristics of 4H−SiC p+−i−n Diodes
  25. Hetero-Epitaxial Single Crystal 3C-SiC Opto-Mechanical Pressure Sensor
  26. Microwave Annealing of Al+ Implanted 4H-SiC: Towards Device Fabrication
  27. Al+ Implanted 4H-SiC p+-i-n Diodes: Evidence for Post-Implantation-Annealing Dependent Defect Activation
  28. Al+ Implanted 4H-SiC: Improved Electrical Activation and Ohmic Contacts
  29. Steady-State Analysis of a Normally-Off 4H-SiC Trench Bipolar-Mode FET
  30. Simulation of the Temperature Dependence of Hall Carriers in Al Doped 4H-SiC
  31. 2D Simulation of under-Mask Penetration in 4H-SiC Implanted with Al+ Ions
  32. Improving Doping Efficiency of P+ Implanted Ions in 4H-SiC
  33. Carbon-Cap for Ohmic Contacts on n-Type Ion Implanted 4H-SiC
  34. Simulation of the Incomplete Ionization of the n-Type Dopant Phosphorus in 4H-SiC, Including Screening by Free Carriers
  35. Numerical Simulations of a 4H-SiC BMFET Power Transistor with Normally-Off Characteristics
  36. Ultra Fast High Temperature Microwave Annealing of Ion Implanted Large Bandgap Semiconductors
  37. Improvement of Electron Channel Mobility in 4H SiC MOSFET by Using Nitrogen Implantation
  38. Room Temperature Annealing Effects on Leakage Current of Ion Implanted p+n 4H-SiC Diodes
  39. Effects of N Implantation before Gate Oxidation on the Performance of 4H-SiC MOSFET
  40. Post-Implantation Annealing of SiC: Relevance of the Heating Rate
  41. Post-Implantation Annealing of SiC: Relevance of the Heating Rate
  42. Characterization of MOS Capacitors Fabricated on n-type 4H-SiC Implanted with Nitrogen at High Dose
  43. Fabrication of MOS Capacitors by Wet Oxidation of p-Type 4H-SiC Preamorphized by Nitrogen Ion Implantation
  44. Effects of Very High Neutron Fluence Irradiation on p+n Junction 4H-SiC Diodes
  45. Correlation between Current Transport and Defects in n+/p 6H-SiC Diodes
  46. Current Analysis of Ion Implanted p+/n 4H-SiC Junctions: Post-Implantation Annealing in Ar Ambient
  47. Post-Implantation Annealing in a Silane Ambient Using Hot-Wall CVD
  48. Minimum Ionizing Particle Detector Based on p+n Junction SiC Diode
  49. Competition between Oxidation and Recrystallization in Ion Amorphized (0001) 6H-SiC
  50. Contact Resistivity and Barrier Height of Al/Ti Ohmic Contacts on p-Type Ion Implanted 4H- and 6H-SiC
  51. SILICON CARBIDE PARTICLE DETECTORS: ANALYSIS AND SIMULATION
  52. Structural Characterization of Alloyed Al/Ti and Ti Contacts on SiC
  53. Extraction of the Schottky Barrier Height for Ti/Al Contacts on 4H-SiC from I-V and C-V Measurements
  54. A Highly Effective Edge Termination Design for SiC Planar High Power Devices
  55. Characterization of a Thermal Oxidation Process on SiC Preamorphized by Ar Ion Implantation
  56. He+ ion damage in 4H-SiC studied by charge collection efficiency measurements.
  57. Electrical Characterization of Ion-Implanted n+/p 6H-SiC Diodes
  58. Al/Ti Ohmic Contacts to p-Type Ion-Implanted 6H-SiC: Mono- and Two- Dimensional Analysis of TLM Data
  59. Low-Temperature Thermal Oxidation of Ion-Amorphized 6H-SiC
  60. channeling stopping power of MeV He+ ions in 4H- and 6H-SiC.
  61. Comparison between Chemical and Electrical Profiles in Al+ or N+ Implanted and Annealed 6H-SiC
  62. Highly-Doped Implanted pn Junction for SiC Zener Diode Fabrication
  63. 4H- and 6H-SiC Rutherford Back Scattering-Channeling Spectrometry: Polytype Finger Printing