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This page is a summary of: Influence of Metal and Polymer Substrate on SiCxNyOz Film Formation by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases, ECS Journal of Solid State Science and Technology, January 2019, The Electrochemical Society,
DOI: 10.1149/2.0101908jss.
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