Publication not explained

This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.

If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.

Featured Image

Read the Original

This page is a summary of: Ge-ion implantation and activation in (100) β-Ga2O3 for ohmic contact improvement using pulsed rapid thermal annealing, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, May 2023, American Vacuum Society,
DOI: 10.1116/6.0002642.
You can read the full text:

Read

Contributors

The following have contributed to this page