All Stories

  1. Impact of Diamond-like Carbon Films on Reverse Torque: Superior Performance in Implant Abutments with Internal Conical Connections
  2. Exploring TMA and H2O Flow Rate Effects on Al2O3 Thin Film Deposition by Thermal ALD: Insights from Zero-Dimensional Modeling
  3. Size-Dependent High-Pressure Behavior of Pure and Eu3+-Doped Y2O3 Nanoparticles: Insights from Experimental and Theoretical Investigations
  4. Use of silicon or carbonitriding interface in the adhesion of Ag-DLC film on titanium alloy: a comparative study
  5. Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth
  6. Tailoring Black TiO2 Thin Films: Insights from Hollow Cathode Hydrogen Plasma Treatment Duration
  7. Identification of Self-Buffer Layer on GaN/glass Films Grown by Reactive Sputtering
  8. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
  9. A Global Model Study of Plasma Chemistry and Propulsion Parameters of a Gridded Ion Thruster Using Argon as Propellant
  10. Effect of a diamond-like carbon film on the mechanical and surface properties of microwave-cured polymethylmethacrylate
  11. Control and data acquisition system to study dielectric breakdown in low-pressure DC plasma reactor with parallels electrodes
  12. Control and data acquisition system to study dielectric breakdown in low-pressure DC plasma reactor with parallels electrodes
  13. Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit
  14. Antimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albicans
  15. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
  16. Study of aluminum nitride films deposited on silicon for fabrication of MEMs devices
  17. A global model study of argon plasma chemistry used as propellant of a gridded ion thruster
  18. SiOx Top Layer on DLC Films for Atomic Oxygen and Ozone Corrosion Protection in Aerospace Applications
  19. Secondary ion mass spectrometry and atomic force microscopy analysis of silver-doped diamond-like carbon films on titanium alloy (Ti6Al4V) for possible biomedical application
  20. Physicochemical Studies on the Surface of Polyamide 6.6 Fabrics Functionalized by DBD Plasmas Operated at Atmospheric and Sub-Atmospheric Pressures
  21. Effect of Ozone Exposure on Water Uptake and Germination of Lentil (Lens Culinaris) Seeds
  22. Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity
  23. Effect of DLC Films with and without Silver Nanoparticles Deposited On Titanium Alloy
  24. Plasmas and Processes of Materials
  25. Diamond-like carbon films over reconstructive TMJ prosthetic materials: Effects in the cytotoxicity, chemical and mechanical properties
  26. The Effect of Plasma Nitriding on the Fatigue Behavior of the Ti-6Al-4V Alloy
  27. Effect of Plasma Nitriding on Fatigue Behavior of Ti-6Al-4V Alloy
  28. Plasma nanotexturing of amorphous carbon films by reactive ion etching
  29. Effect of Plasma Nitriding on the Creep and Tensile Properties of the Ti-6Al-4V Alloy
  30. Correction to: Plasma processed carbon thin films applied to dye-sensitized solar cells
  31. Plasma processed carbon thin films applied to dye-sensitized solar cells
  32. O2 plasma sintering study of TiO2 photoelectrodes in dye solar cells
  33. The influence of aluminum incorporation on the structural and electrical properties of ZnO thin films for applications in piezoresistive sensors
  34. Antimicrobial and anti-biofilm properties of polypropylene meshes coated with metal-containing DLC thin films
  35. Creep behavior evaluation and characterization of SiC film with Cr interlayer deposited by HiPIMS in Ti-6Al-4V alloy
  36. Numeric Model for Assessment of Naphthalene Conversion through Ionization Reactions in a Microwave Air Plasma Torch
  37. Diffusion of silicon in titanium dioxide thin films with different degree of crystallinity: Efficiency of TiO2 and TiN barrier layers
  38. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications
  39. Abutment Coating With Diamond-Like Carbon Films to Reduce Implant–Abutment Bacterial Leakage
  40. Optical, electrical and electrochemical evaluation of sputtered platinum counter electrodes for dye sensitized solar cells
  41. Microwave Air Plasma Applied to Naphthalene Thermal Conversion
  42. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy
  43. Coating Dental Implant Abutment Screws with Diamondlike Carbon Doped with Diamond Nanoparticles: The Effect on Maintaining Torque After Mechanical Cycling
  44. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS
  45. Effect of metal target power on the properties of co-sputtered Sn-DLC and W-DLC thin films
  46. Electrical Conduction Mechanisms in Metal–Insulator–Metal (MIM) Structure with TiO x N y Thin Films Deposited with Different O/N Ratios
  47. Evaluation of piezoresistivity properties of sputtered ZnO thin films
  48. Optical Characterization of Glow and Afterglow Regions of Ar/O2Microwave Plasma: Effect of Applied Power and Gas Flow
  49. Characterization of SiC thin films deposited by HiPIMS
  50. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control
  51. Development of Dye-Sensitized Solar Cells with Sputtered N-DopedTiO2Thin Films: From Modeling the Growth Mechanism of the Films to Fabrication of the Solar Cells
  52. Electrical and Structural Characterization of Sn-DLC Thin Films for Piezoresistive Sensors
  53. Influence of gas and treatment time on the surface modification of EPDM rubber treated at afterglow microwave plasmas
  54. Si-based thin film coating on Y-TZP: Influence of deposition parameters on adhesion of resin cement
  55. High quality TiO2 deposited by reactive sputtering. Structural and electrical peculiarities influenced by the specific experimental conditions
  56. Fabrication of dye-sensitized solar cells with N-doped TiO2 thin films: Effect of the nitrogen doping on the photoexcitation processes and generation of electron acceptor states
  57. Effect of Diamond-Like Carbon Thin Film Coated Acrylic Resin onCandida albicansBiofilm Formation
  58. Modeling the reactive sputter deposition of N-doped TiO2 for application in dye-sensitized solar cells: Effect of the O2 flow rate on the substitutional N concentration
  59. Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4Plasma Etching of Silicon
  60. Amorphous Silicon Carbide Thin Films Deposited by Magnetron Co-Sputtering: Effect of Applied Power and Deposition Pressure on Film Characteristics
  61. Tuning the properties of SiC films by dual magnetron sputtering
  62. Chemical bonds, electrical resistivity and hardness of argon-incorporated SiC films
  63. Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique
  64. Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation
  65. Control of the substrate temperature using a triode magnetron sputtering system
  66. Surface modification of EPDM rubber by microwave excited plasmas
  67. Influence of the Nitrogen Concentration on the Photoinduced Hydrophilicity of N-doped Titanium Dioxide Thin Films Deposited by Plasma Sputtering
  68. Titanium dioxide thin films deposition by direct current hollow cathode magnetron sputtering
  69. Influence of Electronegative Gas on the Efficiency of Conventional and Hollow Cathode Magnetron Sputtering Systems
  70. Effect of gas residence time on the morphology of silicon surface etched in SF6 plasmas
  71. Role of the Temperature on the Interaction Mechanisms Between Argon–Oxygen Post-Discharge and Hexatriacontane
  72. Surface improvement of EPDM rubber by plasma treatment
  73. Off-axis growth of AlN thin films by hollow cathode magnetron sputtering under various nitrogen concentrations
  74. Surface modification of EPDM in r.f. plasma: process optimization and surface characterization
  75. Effect of the Substrate Heating Due to the Sputtering Process on the Crystallinity of TiO2 Thin Films
  76. Study of residual gas formed during plasma debinding of powder injection moulded parts
  77. A study of defects in ultra-thin transparent coatings on polymers