All Stories

  1. Glows, arcs, ohmic discharges: An electrode-centered review on discharge modes and the transitions between them
  2. Energetic Electron-Assisted Synthesis of Tailored Magnetite (Fe3O4) and Maghemite (γ−Fe2O3) Nanoparticles: Structure and Magnetic Properties
  3. Time- and Position-Dependent Breakdown Volume Calculations to Explain Experimentally Observed Femtosecond Laser-Induced Plasma Properties
  4. Low‐temperature atmospheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films
  5. Foundations of physical vapor deposition with plasma assistance
  6. Building on excellence and reputation, a more inclusive Journal of Applied Physics evolves
  7. On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge
  8. Electron transport in high power impulse magnetron sputtering at low and high working gas pressure
  9. Dynamics and 2D temperature distribution of plasma obtained by femtosecond laser-induced breakdown
  10. High-resolution observation of cathodic arc spots in a magnetically steered arc plasma source in low pressure argon, nitrogen, and oxygen atmospheres
  11. Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge
  12. High-resolution observation of cathode spots in a magnetically steered vacuum arc plasma source
  13. Properties of secondary ions in ion beam sputtering of Ga2O3
  14. Role of Reaction Intermediate Diffusion on the Performance of Platinum Electrodes in Solid Acid Fuel Cells
  15. Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films
  16. On the electron energy distribution function in the high power impulse magnetron sputtering discharge
  17. Meeting today’s needs in applied physics publishing
  18. On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering
  19. Vanadium oxide coatings to self-regulate current sharing in high-temperature superconducting cables and magnets
  20. Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering
  21. Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions
  22. Insights into surface modification and erosion of multi-element arc cathodes using a novel multilayer cathode design
  23. Serving a scientific community in an evolving research landscape
  24. Erosion and cathodic arc plasma of Nb–Al cathodes: composite versus intermetallic
  25. Micro-propulsion based on vacuum arcs
  26. Influence of Ar gas pressure on ion energy and charge state distributions in pulsed cathodic arc plasmas from Nb-Al cathodes studied with high time resolution
  27. Time-resolved ion energy and charge state distributions in pulsed cathodic arc plasmas of Nb−Al cathodes in high vacuum
  28. Plasma studies of a linear magnetron operating in the range from DC to HiPIMS
  29. Direct observation of spoke evolution in magnetron sputtering
  30. Sputtering of pure boron using a magnetron without a radio-frequency supply
  31. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
  32. Phase tailoring of tantalum thin films deposited in deep oscillation magnetron sputtering mode
  33. Plasma potential of a moving ionization zone in DC magnetron sputtering
  34. Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOxfilm growth
  35. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas
  36. Editorial: Celebrating the 85th Anniversary of Journal of Applied Physics
  37. Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas
  38. Room Temperature Oxide Deposition Approach to Fully Transparent, All-Oxide Thin-Film Transistors
  39. Plasma of Vacuum Discharges: The Pursuit of Elevating Metal Ion Charge States, Including a Recent Record of Producing Bi13+
  40. Adding high time resolution to charge-state-specific ion energy measurements for pulsed copper vacuum arc plasmas
  41. Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres
  42. Ion energies in high power impulse magnetron sputtering with and without localized ionization zones
  43. Editorial: Raising the bar—Providing a home
  44. Propagation direction reversal of ionization zones in the transition between high and low current magnetron sputtering
  45. Localized heating of electrons in ionization zones: Going beyond the Penning-Thornton paradigm in magnetron sputtering
  46. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
  47. Drifting Ionization Zone in DC Magnetron Sputtering Discharges at Very Low Currents
  48. Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering
  49. Unusual Cathode Erosion Patterns Observed for Steered Arc Sources
  50. Ion energies in vacuum arcs: A critical review of data and theories leading to traveling potential humps
  51. Dyke Award - Ffor distinguished work on discharges and electrical insulation in vacuum
  52. Controlling ion fluxes during reactive sputter-deposition of SnO2:F
  53. Editorial: Journal of Applied Physics in a changing world of scientific publication
  54. Fermi level stabilization and band edge energies in CdxZn1−xO alloys
  55. Observation of multiple charge states and high ion energies in high-power impulse magnetron sputtering (HiPIMS) and burst HiPIMS using a LaB6target
  56. On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics
  57. Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons
  58. 2-D mathematical modeling for a large electrochromic window—Part I
  59. Drifting potential humps in ionization zones: The “propeller blades” of high power impulse magnetron sputtering
  60. Size and composition-controlled fabrication of thermochromic metal oxide nanocrystals
  61. Ion Charge State Distributions of Al and Cr in Cathodic Arc Plasmas From Composite Cathodes in Vacuum, Argon, Nitrogen, and Oxygen
  62. Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas
  63. On sheath energization and Ohmic heating in sputtering magnetrons
  64. Crystal structure and properties of CdxZn1−xO alloys across the full composition range
  65. Dopant-induced band filling and bandgap renormalization in CdO : In films
  66. Estimating electron drift velocities in magnetron discharges
  67. Structural, optical, and electrical properties of indium-doped cadmium oxide films prepared by pulsed filtered cathodic arc deposition
  68. Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states
  69. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition
  70. Plasma flares in high power impulse magnetron sputtering
  71. Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride
  72. Determining the nonparabolicity factor of the CdO conduction band using indium doping and the Drude theory
  73. Charge state distributions of Al and Cr cathodic arc plasmas
  74. Phase transitions in vacuum arcs in the context of liquid metal arc sources
  75. Efficient, Low Cost Synthesis of Sodium Platinum Bronze NaxPt3O4
  76. Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
  77. Self-organization and self-limitation in high power impulse magnetron sputtering
  78. The evolution of ion charge states in cathodic vacuum arc plasmas: a review
  79. Plasma potential mapping of high power impulse magnetron sputtering discharges
  80. Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering
  81. Introduction
  82. Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films
  83. The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering
  84. Optical studies of strained InGaN/GaN quantum structures implanted with europium for red light emitting diodes
  85. Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition
  86. A Plasma Lens for Magnetron Sputtering
  87. Hollow Plasma in a Solenoid
  88. Dynamically Modulating the Surface Plasmon Resonance of Doped Semiconductor Nanocrystals
  89. A synchronized emissive probe for time-resolved plasma potential measurements of pulsed discharges
  90. Chemistry, phase formation, and catalytic activity of thin palladium-containing oxide films synthesized by plasma-assisted physical vapor deposition
  91. Optical properties of ferromagnetic ytterbium-doped III-nitride epilayers
  92. Dense Metal Plasma in a Solenoid for Ion Beam Neutralization
  93. Measurements of the Ion Species of Cathodic Arc Plasma in an Axial Magnetic Field
  94. Analysis of Bulk and Thin Film Model Samples Intended for Investigating the Strain Sensitivity of Niobium-Tin
  95. Achieving high mobility ZnO : Al at very high growth rates by dc filtered cathodic arc deposition
  96. Preparation of high transmittance ZnO:Al film by pulsed filtered cathodic arc technology and rapid thermal annealing
  97. High Rate Deposition of High Quality ZnO:Al by Filtered Cathodic Arc
  98. Compression and strong rarefaction in high power impulse magnetron sputtering discharges
  99. Effect of the carbon content on the structure and mechanical properties of Ti–Si–C coatings by cathodic arc evaporation
  100. Optical and magnetic properties of GaN epilayers implanted with ytterbium
  101. Ion acceleration and cooling in gasless self-sputtering
  102. Antibacterial efficacy of advanced silver-amorphous carbon coatings deposited using the pulsed dual cathodic arc technique
  103. Beneficial silver: antibacterial nanocomposite Ag-DLC coating to reduce osteolysis of orthopaedic implants
  104. Origin of the Delayed Current Onset in High-Power Impulse Magnetron Sputtering
  105. A seemingly simple task: Filling a solenoid volume in vacuum with dense plasma
  106. Ion species and charge states of vacuum arc plasma with gas feed and longitudinal magnetic field
  107. Deposition rates of high power impulse magnetron sputtering: Physics and economics
  108. Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering
  109. High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
  110. A structure zone diagram including plasma-based deposition and ion etching
  111. High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition
  112. Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region
  113. A self-sputtering ion source: A new approach to quiescent metal ion beams
  114. Unfiltered and Filtered Cathodic Arc Deposition
  115. Structural and spectroscopic studies of InGaN/GaN quantum structures implanted with rare earth ions
  116. Electronic structure and conductivity of nanocomposite metal (Au, Ag, Cu, Mo)-containing amorphous carbon films
  117. Broad, intense, quiescent beam of singly charged metal ions obtained by extraction from self-sputtering plasma far above the runaway threshold
  118. A space-charge-neutralizing plasma for beam drift compression
  119. Progress in beam focusing and compression for warm-dense matter experiments
  120. Spectra and energy levels of Yb3+ in AlN
  121. Impact of Annealing on the Conductivity of Amorphous Carbon Films Incorporating Copper and Gold Nanoparticles Deposited by Pulsed Dual Cathodic Arc
  122. Deep oxidation of methane on particles derived from YSZ-supported Pd–Pt-(O) coatings synthesized by Pulsed Filtered Cathodic Arc
  123. A discussion on the absence of plasma in spark plasma sintering
  124. Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer
  125. Simulations and experiments of intense ion beam current density compression in space and time
  126. Plasma “anti-assistance” and “self-assistance” to high power impulse magnetron sputtering
  127. Physical limits for high ion charge states in pulsed discharges in vacuum
  128. Surface transformation of graphite or diamond following Highly Charged Ion irradiation
  129. Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator
  130. Comparative surface and nano-tribological characteristics of nanocomposite diamond-like carbon thin films doped by silver
  131. Electrical properties of a-C: Mo films produced by dual-cathode filtered cathodic arc plasma deposition
  132. Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows
  133. MeV-ion beam analysis of the interface between filtered cathodic arc-deposited a-carbon and single crystalline silicon
  134. A Theoretical Analysis of Vacuum Arc Thruster and Vacuum Arc Ion Thruster Performance
  135. A summary of recent experimental research on ion energy and charge states of pulsed vacuum arcs
  136. Effects of ozone oxidation on interfacial and dielectric properties of thin HfO2 films
  137. High charge state ions extracted from metal plasmas in the transition regime from vacuum spark to high current vacuum arc
  138. Sputtering in vacuum: A technology for ultraclean metallization and space propulsion
  139. Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
  140. The absence of plasma in “spark plasma sintering”
  141. Measurements of the asymmetric dynamic sheath around a pulse biased sphere immersed in flowing metal plasma
  142. Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper
  143. Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion
  144. Functionalization of hydrogen-free diamond-like carbon films using open-air dielectric barrier discharge atmospheric plasma treatments
  145. Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions
  146. Coalescence of magnetron-sputtered silver islands affected by transition metal seeding (Ni, Cr, Nb, Zr, Mo, W, Ta) and other parameters
  147. The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering
  148. Structure and properties of silver-containing a-C(H) films deposited by plasma immersion ion implantation
  149. Erratum: “High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering” [J. Appl. Phys. 102, 113303 (2007)]
  150. Extractable, elevated ion charge states in the transition regime from vacuum sparks to high current vacuum arcs
  151. Inverted end-Hall-type low-energy high-current gaseous ion source
  152. Temporal development of ion beam mean charge state in pulsed vacuum arc ion sources
  153. High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
  154. Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering
  155. Erratum to “Plasma biasing to control the growth conditions of diamond-like carbon” [Surface and Coatings Technology 201(2007) 4628–4632]
  156. Puzzling differences in bismuth and lead plasmas: Evidence for the significant role of neutrals in cathodic vacuum arcs
  157. Production of neutrals and their effects on the ion charge states in cathodic vacuum arc plasmas
  158. Neutralized drift compression experiments with a high-intensity ion beam
  159. Filtered cathodic arc deposition with ion-species-selective bias
  160. Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
  161. Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering
  162. Metal plasmas for the fabrication of nanostructures
  163. Cathodic Vacuum Arc Plasma of Thallium
  164. Charge-state-resolved ion energy distribution functions of cathodic vacuum arcs: A study involving the plasma potential and biased plasmas
  165. Low-energy linear oxygen plasma source
  166. Plasma biasing to control the growth conditions of diamond-like carbon
  167. Structural, optical, and electrical properties of WOx(Ny) films deposited by reactive dual magnetron sputtering
  168. Smoothing of ultrathin silver films by transition metal seeding
  169. Charge state dependence of cathodic vacuum arc ion energy and velocity distributions
  170. Determination of the specific ion erosion of the vacuum arc cathode by measuring the total ion current from the discharge plasma
  171. Influence of argon and oxygen on charge-state-resolved ion energy distributions of filtered aluminum arcs
  172. Material-dependent high-frequency current fluctuations of cathodic vacuum arcs: Evidence for the ecton cutoff of the fractal model
  173. Physics of arcing, and implications to sputter deposition
  174. Measurement of total ion current from vacuum arc plasma sources
  175. Fourier Analysis of Fast Vacuum Arc Parameters
  176. Plasma-based ion implantation and deposition: a review of physics, technology, and applications
  177. Drift Compression of an Intense Neutralized Ion Beam
  178. Time and material dependence of the voltage noise generated by cathodic vacuum arcs
  179. Instability of a low-pressure hollow-cathode discharge in a magnetic field
  180. Plasma and ion sources in large area coating: A review
  181. Measurements of the total ion flux from vacuum arc cathode spots
  182. The fractal nature of vacuum arc cathode spots
  183. Cathodic arcs: Fractal voltage and cohesive energy rule
  184. Charge-state-resolved ion energy distributions of aluminum vacuum arcs in the absence and presence of a magnetic field
  185. Neutralized transport experiment
  186. Ion charge state fluctuations in vacuum arcs
  187. Time-dependence of ion charge State distributions of vacuum arcs: an interpretation involving atoms and charge exchange collisions
  188. Observation of self-sputtering in energetic condensation of metal ions
  189. Charge state and time resolved plasma composition of a pulsed zirconium arc in a nitrogen environment
  190. Design and characterization of a neutralized-transport experiment for heavy-ion fusion
  191. The kinetic energy of carbon ions in vacuum arc plasmas: A comparison of measuring techniques
  192. Asymmetric injection of cathodic arc plasma into a macroparticle filter
  193. Fundamentals of pulsed plasmas for materials processing
  194. Results on intense beam focusing and neutralization from the neutralized beam experiment
  195. Effect of Ion Mass and Charge State on Transport of Vacuum Arc Plasmas Through a Biased Magnetic Filter
  196. Some effects of magnetic field on a hollow cathode ion source
  197. Flexible system for multiple plasma immersion ion implantation-deposition processes
  198. Tracking down the origin of arc plasma science I. early pulsed and oscillating discharges
  199. Tracking down the origin of arc plasma science-II. early continuous discharges
  200. Temporal development of the composition of Zr and Cr cathodic arc plasma streams in a N2 environment
  201. Bias and self-bias of magnetic macroparticle filters for cathodic arc plasmas
  202. Coalescence of nanometer silver islands on oxides grown by filtered cathodic arc deposition
  203. Ion energy distribution functions of vacuum arc plasmas
  204. Time-resolved emittance of a bismuth ion beam from a pulsed vacuum arc ion source
  205. Energetic deposition using filtered cathodic arc plasmas
  206. Magnetic field effect on the sheath thickness in plasma immersion ion implantation
  207. From plasma immersion ion implantation to deposition: a historical perspective on principles and trends
  208. Plasma chemistry fluctuations in a reactive arc plasma in the presence of magnetic fields
  209. Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field
  210. Angularly resolved measurements of ion energy of vacuum arc plasmas
  211. Atomic scale heating in cathodic arc plasma deposition
  212. Developing high brightness beams for heavy ion driven inertial fusion
  213. Further development of low noise vacuum arc ion source
  214. Imaging the separation of cathodic arc plasma and macroparticles in curved magnetic filters
  215. Inductive energy storage driven vacuum arc thruster
  216. Reducing ion-beam noise of vacuum arc ion sources
  217. Two-dimensional sample temperature modeling in separation by plasma implantation of oxygen (SPIMOX) process
  218. Magnetic system for producing uniform coatings using a filtered cathodic arc
  219. Guest editorial special issue on vacuum discharge plasmas
  220. Correlation between cathode properties, burning voltage, and plasma parameters of vacuum arcs
  221. Energetics of vacuum arc cathode spots
  222. Arc-discharge ion sources for heavy ion fusion
  223. Recent advances in high current vacuum arc ion sources for heavy ion fusion
  224. MBE growth of (In)GaAsN on GaAs using a constricted DC plasma source
  225. A periodic table of ion charge-state distributions observed in the transition region between vacuum sparks and vacuum arcs
  226. Measurements of secondary electrons emitted from conductive substrates under high-current metal ion bombardment
  227. Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: measurements and analytical considerations
  228. Magnetic-field-dependent plasma composition of a pulsed aluminum arc in an oxygen ambient
  229. Ultrathin diamond-like carbon films deposited by filtered carbon vacuum arcs
  230. Synthesis of Ultrathin Ta-C Films by Twist-Filtered Cathodic Arc Carbon Plasmas
  231. Review of cathodic arc deposition technology at the start of the new millennium
  232. Twist filter for the removal of macroparticles from cathodic arc plasmas
  233. Chopping effect observed at cathodic arc initiation
  234. Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review
  235. Velocity distribution of carbon macroparticles generated by pulsed vacuum arcs
  236. Designing advanced filters for macroparticle removal from cathodic arc plasmas
  237. Evaluation of the plasma distribution of a quasi-linear constricted plasma source
  238. Plasma fluctuations, local partial Saha equilibrium, and the broadening of vacuum-arc ion charge state distributions
  239. Interaction of vacuum-arc-generated macroparticles with a liquid surface
  240. Effect of the pulse repetition rate on the composition and ion charge-state distribution of pulsed vacuum arcs
  241. `Triggerless' triggering of vacuum arcs
  242. Ion charge state distributions of pulsed vacuum arcs-interpretation of their temporal development
  243. Macroparticle filtering of high-current vacuum arc plasmas
  244. S-shaped magnetic macroparticle filter for cathodic arc deposition
  245. Vacuum-spark metal ion source based on a modified Marx generator
  246. Surface modification of nickel battery electrodes by cobalt plasma immersion ion implantation and deposition
  247. Recent advances in vacuum arc ion sources
  248. Diamond growth on hard carbon films
  249. Ion charge state distributions in high current vacuum arc plasmas in a magnetic field
  250. Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing
  251. High-resolution imaging of vacuum arc cathode spots
  252. Formation of metal oxides by cathodic arc deposition
  253. The working principle of the hollow-anode plasma source
  254. Self-sustained self-sputtering: a possible mechanism for the superdense glow phase of a pseudospark
  255. Transport of vacuum arc plasmas through magnetic macroparticle filters
  256. Development of hard carbon coatings for thin-film tape heads
  257. Film Synthesis on Powders by Cathodic ARC Plasma Deposition
  258. Erratum: ‘‘Surface modification of magnetic recording heads by plasma immersion ion implantation and deposition’’ [J. Appl. Phys. 76, 1656 (1994)]
  259. Electron emission from pseudospark cathodes
  260. Surface modification of magnetic recording heads by plasma immersion ion implantation and deposition
  261. Effect of duct bias on transport of vacuum arc plasmas through curved magnetic filters
  262. Focused injection of vacuum arc plasmas into curved magnetic filters
  263. Vacuum arc ion source with filtered plasma for macroparticle‐free implantation
  264. Vacuum arc ion sources: Some vacuum arc basics and recent results (invited)
  265. Macroparticle‐free thin films produced by an efficient vacuum arc deposition technique
  266. Model for explosive electron emission in a pseudospark ‘‘superdense glow’’
  267. Time dependence of vacuum arc parameters
  268. On the macroparticle flux from vacuum arc cathode spots
  269. Joining of Metal Films to Carbon-Carbon Composite Material by Metal Plasma Immersion Ion Implantation
  270. Brightness distribution and current density of vacuum arc cathode spots
  271. Pressure ionization: its role in metal vapour vacuum arc plasmas and ion sources
  272. Vacuum arc cathode spot parameters from high‐resolution luminosity measurements
  273. Pulsed dye laser diagnostics of vacuum arc cathode spots
  274. Emission spectroscopy of low-current vacuum arcs
  275. Thermal instability of a super-high-pressure xenon discharge
  276. On modes of arc cathode operation
  277. Validity conditions for complete and partial local thermodynamic equilibrium of nonhydrogenic level systems and their application to copper vapor arcs in vacuum
  278. A high-voltage surface effect on dielectrics in vacuum
  279. Cathodic are spots: Ignition probability as a a fundamental concept to describe spot types, phases, and motion
  280. Measurement of total ion flux in vacuum are discharges