What is it about?
Surface discharge that induces non-equibrium 2-dimensional plasma was employed to deposit ZnO film on PET substrate. The discharge energy was easily tuned by controlling the grid pattern on the electrode as well as the input AC bias. After irradiating a plasma to the precursor pre-coated on a substrate for a few minutes, hexagonal ZnO single phase was obtained. The crystallization was restricted within the selective area adjacent to the plasma to leave a clear step after washing the substrate in water.
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Why is it important?
Surface discharge technique was developed to deposit ZnO film on PET substrate. An active plasma induced on the electrode promoted the crystallization of hexagonal ZnO, and left a step on the glass substrate after removing a residual precursor by washing with water.
Perspectives
The film formation technique has many common features with a plasma display panel, therefore, it will be further developed to a novel industrial tool for a film formation.
masayuki okuya
Shizuoka Daigaku
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This page is a summary of: Direct patterning in ZnO film formation by surface discharge technique, Applied Physics Express, December 2013, Japan Society of Applied Physics,
DOI: 10.7567/apex.7.015501.
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