What is it about?
This article summarizes the latest advancements in synthesizing silicon carbide (SiC) films, from chemical vapor deposition (CVD) to atomic layer deposition (ALD). It also investigates their diverse applications, ranging from microelectromechanical systems (MEMS) to nanoelectromechanical systems (NEMS).
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Why is it important?
It reports the methods of synthesizing SiC films and their wide-ranging applications in MEMS and NEMS. Understanding these advances is crucial for optimizing fabrication processes and harnessing the full potential of SiC in various industries, from electronics to aerospace, due to its exceptional properties like high temperature resistance and mechanical strength.
Perspectives
This review article offers a comprehensive overview of SiC film synthesis techniques and their applications in MEMS and NEMS. It paves the way for future research aimed at refining fabrication methods, expanding application areas, and unlocking the full potential of SiC in advanced micro and nanoscale technologies
Prof. Dr. Mariana Amorim Fraga
Universidade Presbiteriana Mackenzie
Read the Original
This page is a summary of: Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS, Micromachines, August 2020, MDPI AG,
DOI: 10.3390/mi11090799.
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