This shareable PDF can be hosted on any platform or network and is fully compliant with publisher copyright.
This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.
If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.
This page is a summary of: Study of Low Resistivity and High Work Function ITO Films Prepared by Oxygen Flow Rates and N2O Plasma Treatment for Amorphous/Crystalline Silicon Heterojunction Solar Cells, Journal of Nanoscience and Nanotechnology, December 2014, American Scientific Publishers,
DOI: 10.1166/jnn.2014.10142.
You can read the full text:
The following have contributed to this page
