Innovative M(Hfa)2●TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: an Integrated Theoretical and Experimental Approach

Alberto Gasparotto, Davide Barreca, Anjana Devi, Roland Fischer, Ettore Fois, Aldo Gamba, Chiara Maccato, Roberta Seraglia, Gloria Tabacchi, Eugenio Tondello
  • January 2009, The Electrochemical Society
  • DOI: 10.1149/1.3207638

CVD Precursors for Mixed Cobalt-Copper Oxides

What is it about?

We shed light on the structure, bonding and reactivity of Co(II) and Cu(II) complexes useful for the synthesis of mixed Co-Cu oxide nanomaterials, evidencing analogies and differences as a function of the nature of the metal center.

Why is it important?

Mixed copper-cobalt oxides are versatile materials for utilization in the field of catalysis, gas sensing and energetics. The development of suitable synthetic strategies to such systems is extremely important in order to control their composition, morphology and nano-organization, thus directly tailoring the resulting functional performances. The Chemical Vapor Deposition (CVD) technique is a particularly valuable for the preparation of mixed Cu-Co oxides in the form of powders, thin films and nanosystems, in view of its inherent flexibility. In this context, we present two metal-organic CVD precursors with optimized properties for such applications.

Perspectives

Gloria Tabacchi
university of insubria

We elucidated the structure, bonding, fragmentation pathways and thermal properties of copper and cobalt CVD precursors with a synergic approach combining forefront experimental and theoretical techniques. Beside understanding the precursor properties as a function of their structural and chemical nature, this study opened the way to the combined use of these complexes in one-step CVD routes to Cu-Co-O nanosystems.

Read Publication

http://dx.doi.org/10.1149/1.3207638

The following have contributed to this page: Gloria Tabacchi