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This page is a summary of: Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography, Japanese Journal of Applied Physics, December 1998, Japan Society of Applied Physics,
DOI: 10.1143/jjap.37.6873.
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