Publication
CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design
Akif Sultan, John Faricelli, Sushant Suryagandh, Hans vanMeer, Kaveri Mathur, James Pattison, Sean Hannon, Greg Constant, Kalyana Kumar, Kevin Carrejo, Joe Meier, Rasit O. Topaloglu, Darin Chan, Uwe Hahn, Thorsten Knopp, Victor Andrade, Bill Gardiol, Steve Hejl, David Wu, James Buller, Larry Bair, Ali Icel, Yuri Apanovich
March 2009, Institute of Electrical & Electronics Engineers (IEEE)
DOI: 10.1109/isqed.2009.4810335