What is it about?
The preparation of several-layer TMD materials in the chemical vapor deposition chamber (CVD) is very popular because of the possibility of controlling the growth parameters such as the number of layers, crystal orientation, and crystalline domain size. There is a lack of inspection techniques to observe the growth of thin-films directly in the CVD chamber in real time. In this publication, we report on the construction of a laboratory X-ray scattering set-up to observe the crystallization of TMD thin film in the CVD chamber in real time.
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Why is it important?
The important is that our measurement is performed in laboratory conditions using a laboratory microfocus X-ray source and photon counting 2D X-ray detector, and not at synchrotrons. There is the possibility of transferring the presented set-up from the laboratory to industrial inspection.
Perspectives
The presented laboratory experimental set-up could be improved using new-generation X-ray sources such as metal-jet X-ray sources.
Karol Vegso
Institute of Physics, Slovak Academy of Sciences
Read the Original
This page is a summary of: A wide-angle X-ray scattering laboratory setup for tracking phase changes of thin films in a chemical vapor deposition chamber, Review of Scientific Instruments, November 2022, American Institute of Physics,
DOI: 10.1063/5.0104673.
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