What is it about?
We use a quite exotic technology for the creation of micro-optical and micro-mechanical components with very high accuracy for various applications. The fabrication technology makes use of highly energetic protons which we use to irradiate a negative photoresist material. During irradiation, the material is cross-linked such that high-quality micro-pillars can be obtained, which can serve applications like interfacing structures for optical interconnects.
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Why is it important?
For some micro-components it is highly beneficial to use a negative resist rather than a positive resist material. In particular, for the generation of micro-pillars or arrays thereof, it is much more time-efficient to irradiate the pillar itself rather than all the material surrounding it. We have in this paper advanced the achievable aspect ratio for proton-based fabrication of these pillar structures.
Perspectives
This paper presents our first thorough investigation of the use Deep Proton Writing on negative photoresist materials, especially useful for creating arrays of micro-pillars. We have also shown that deep proton writing is also compatible with high-volume production through polymer replication, paving the way towards mass-deployment of the fabricated devices.
Prof Jurgen Van Erps
Vrije Universiteit Brussel
Read the Original
This page is a summary of: Deep proton writing of high aspect ratio SU-8 micro-pillars on glass, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, December 2016, Elsevier,
DOI: 10.1016/j.nimb.2016.11.014.
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