What is it about?
This paper reports high efficient fabrication of uniform CNT thin film on large size substrates (from 4-inch wafer to 2.5th generation back plane glasses (370mm × 470mm)) with controlled density by dip coating method. High performance carbon nantoube thin film transistors with high performance uniformity were obtained by using such fabricated CNT films.
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Why is it important?
We demonstrated that fabrication of uniform CNT thin film with controlled density is easy and the fabrication process is scalable to large size substrates with high throughput. This is critical for practical applicaiton of CNT-TFT technology.
Perspectives
This work pushes a solid step towards practical manufacturing of CNT-TFTs. We believe active matrix CNT-TFT driven display will be soon demonstrated.
Xuelei Liang
Key laboratory for the physics and chemistry of nanodevices, Peking University
Read the Original
This page is a summary of: Large-area and highly uniform carbon nanotube film for high-performance thin film transistors, Nano Research, April 2018, Tsinghua University Press,
DOI: 10.1007/s12274-018-2025-9.
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