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This page is a summary of: Graphoepitaxial Directed Self-Assembly of Polystyrene-Block-Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to Fabricate Nanoscale Silicon Patterns, Advanced Materials Interfaces, March 2014, Wiley,
DOI: 10.1002/admi.201300102.
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