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  1. New registration calibration strategies for MBMW tools by PROVE measurements

    Article • November 2022, SPIE

    Dr, Dipl-Ing. Peter Hudek

  2. Multi-beam mask writer exposure optimization for EUV mask stacks

    Article • Journal of Micro/Nanopatterning Materials and Metrology, October 2021, SPIE

    Dr, Dipl-Ing. Peter Hudek

  3. MBMW exposure optimization for EUV mask stacks

    Article • February 2021, SPIE

    Dr, Dipl-Ing. Peter Hudek

  4. Mask process correction validation for multi-beam mask lithography

    Article • November 2018, SPIE

    Dr, Dipl-Ing. Peter Hudek

  5. Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

    Article • July 2015, SPIE

    Dr, Dipl-Ing. Peter Hudek

  6. Bulk micromachining of SiC substrate for MEMS sensor applications

    Article • Microelectronic Engineering, October 2013, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  7. MEMS pressure sensor fabricated by advanced bulk micromachining techniques

    Article • May 2013, SPIE

    Dr, Dipl-Ing. Peter Hudek

  8. Laser ablation: A supporting technique to micromachining of SiC

    Article • November 2012, Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  9. Micromachined membrane structures for pressure sensors based on AlGaN/GaN circular HEMT sensing device

    Article • Microelectronic Engineering, October 2012, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  10. Optimization of illumination pupils and mask structures for proximity printing

    Article • Microelectronic Engineering, May 2010, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  11. A suspended plate viscosity sensor featuring in-plane vibration and piezoresistive readout

    Article • Journal of Micromechanics and Microengineering, June 2009, Institute of Physics Publishing

    Dr, Dipl-Ing. Peter Hudek

  12. New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool

    Article • October 2008, Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  13. Investigation of high-resolution contact printing

    Article • Microelectronic Engineering, May 2008, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  14. MAGIC: a European program to push the insertion of maskless lithography

    Article • March 2008, SPIE

    Dr, Dipl-Ing. Peter Hudek

  15. Fogging effect correction method in high-resolution electron beam lithography

    Article • Microelectronic Engineering, May 2007, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  16. Exposure optimization in high-resolution e-beam lithography

    Article • Microelectronic Engineering, April 2006, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  17. Mechanical characterization of membrane like microelectronic components

    Article • Microelectronic Engineering, April 2006, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  18. Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology

    Article • January 2005, SPIE

    Dr, Dipl-Ing. Peter Hudek

  19. Fabrication of step and flash imprint lithography templates using a variable shaped-beam exposure tool

    Article • Microelectronic Engineering, November 2004, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  20. Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

    Article • August 2004, SPIE

    Dr, Dipl-Ing. Peter Hudek

  21. Shaped beam technology for nano-imprint mask lithography

    Article • June 2004, SPIE

    Dr, Dipl-Ing. Peter Hudek

  22. Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask

    Article • Thin Solid Films, June 2004, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  23. Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

    Article • August 2003, SPIE

    Dr, Dipl-Ing. Peter Hudek

  24. Micromachined atomic force microscopy sensor with integrated piezoresistive sensor and thermal bimorph actuator for high-speed tapping-mode atomic force microscopy phase-imaging in higher eigenmodes

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2003, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  25. Back to square 9: a demonstration of 9" reticle capability

    Article • December 2002, SPIE

    Dr, Dipl-Ing. Peter Hudek

  26. Tool and process optimization for 100-nm maskmaking using a 50-kV variable shaped e-beam system

    Article • March 2002, SPIE

    Dr, Dipl-Ing. Peter Hudek

  27. Gated field emitter arrays

    Article • Microelectronic Engineering, September 2001, Elsevier

    Professor Stanislaw Mitura, Dr, Dipl-Ing. Peter Hudek

  28. Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission

    Article • Microelectronic Engineering, September 2001, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  29. Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings

    Article • Journal of Physics D Applied Physics, May 2001, Institute of Physics Publishing

    Dr, Dipl-Ing. Peter Hudek, Dr. Matej Jergel

  30. Mechanical, geometrical, and electrical characterization of silicon membranes for open stencil masks

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2001, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  31. Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy

    Article • Microelectronic Engineering, December 2000, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  32. Aqueous base developable epoxy resist for high sensitivity electron beam lithography

    Article • Microelectronic Engineering, June 2000, Elsevier

    Dr Panagiotis Argitis, Dr, Dipl-Ing. Peter Hudek

  33. InGaP/GaAs/InGaP quantum wires grown on pre-patterned substrates by MOVPE

    Article • Microelectronic Engineering, May 2000, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  34. Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr Panagiotis Argitis, Dr, Dipl-Ing. Peter Hudek

  35. Field emission cathode array with self-aligned gate electrode fabricated by silicon micromachining

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Professor Stanislaw Mitura, Dr, Dipl-Ing. Peter Hudek

  36. Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  37. Progress on nanostructuring with Nanojet

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 2000, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  38. SEM and AFM characterisation of high-mesa patterned InP substrates prepared by wet etching

    Article • Materials Science and Engineering B, December 1999, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  39. Preparation of stair-step grooves by wet etching of AlAs/GaAs heterostructures and MOCVD growth of QWR

    Article • Materials Science and Engineering B, November 1999, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  40. A design and fabrication of a 3D force sensitive microprobe for surface characterization

    Article • Microelectronic Engineering, May 1999, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  41. Resolution improvement of ion projector with a low energy spread multicusp ion source

    Article • Microelectronic Engineering, May 1999, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  42. Structural characterization of a lamellar W/Si multilayer grating

    Article • Journal of Applied Physics, January 1999, American Institute of Physics

    Dr. Matej Jergel, Dr, Dipl-Ing. Peter Hudek

  43. Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy

    Article • Journal of Physics D Applied Physics, January 1999, Institute of Physics Publishing

    Dr. Matej Jergel, Dr, Dipl-Ing. Peter Hudek

  44. Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  45. Dry etching with gas chopping without rippled sidewalls

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  46. Experimental results of the stochastic Coulomb interaction in ion projection lithography

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  47. Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, January 1999, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  48. Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1998, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  49. Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1998, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  50. p-n junction-based wafer flow process for stencil mask fabrication

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1998, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  51. Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

    Article • June 1998, SPIE

    Dr, Dipl-Ing. Peter Hudek

  52. Electrical and detection properties of particle detectors based on LEC semi-insulating InP

    Article • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, May 1998, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  53. DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

    Article • Microelectronic Engineering, March 1998, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  54. Micro-technology of densely spaced non-conventional patterns for space applications

    Article • Microelectronic Engineering, March 1998, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  55. Fabrication of multipurpose AFM/SCM/SEP microprobe with integrated piezoresistive deflection sensor and isolated conductive tip

    Article • Microelectronic Engineering, March 1998, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  56. Preparation, characterisation and application of microscopic linear Hall probe arrays

    Article • Solid-State Electronics, March 1998, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  57. The integration of CMOS with plasma-enhanced micromachining

    Article • Surface and Coatings Technology, December 1997, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  58. Deep ultraviolet resists AZ DX-561 and AZ DX-1300P applied for electron beam and masked ion beam lithography

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, November 1997, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  59. Air Bridge Based Planar Hybrid Technology for Microwave and Millimeterwave Applications

    Article • September 1997, Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  60. CD variation in 30-kV EBL due to resist heating: experiment and simulation

    Article • July 1997, SPIE

    Dr, Dipl-Ing. Peter Hudek

  61. Quantitative measurement of the resist heating in a variable shaped electron lithography

    Article • Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena, March 1997, American Vacuum Society

    Dr, Dipl-Ing. Peter Hudek

  62. Patterning of monolayers of crystalline S-layer proteins on a silicon surface by deep ultraviolet radiation

    Article • Microelectronic Engineering, February 1997, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  63. Scanning probe sharp tip formation for IC integration using mesa technique

    Article • Microelectronic Engineering, February 1997, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  64. The influence of polarization effects on an MSGC glass substrate

    Article • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, February 1997, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  65. <title>Chemically amplified deep UV resists for micromachining</title>

    Article • September 1996, SPIE

    Dr, Dipl-Ing. Peter Hudek

  66. <title>Fabrication of piezoresistive-sensed AFM cantilever probe with integrated tip</title>

    Article • September 1996, SPIE

    Dr, Dipl-Ing. Peter Hudek

  67. Evaluation of chemically amplified deep UV resis for micromachining using e-beam lithography and dry etching

    Article • Microelectronic Engineering, January 1996, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  68. Silicon stencil masks for masked ion beam lithography proximity printing

    Article • Microelectronic Engineering, January 1996, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  69. Bulk micromachining of Si by Lithography and Reactive Ion Etching (LIRIE)

    Article • Vacuum, December 1995, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  70. E-beam and RIE examination of chemically amplified positive-tone resist CAMP6

    Article • Microelectronic Engineering, November 1995, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  71. On the application of chemically amplified positive resists to micromachining

    Article • Microelectronic Engineering, February 1995, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  72. Quartz etching for phase shifting masks

    Article • Microelectronic Engineering, February 1995, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  73. MEMS fabrication by Lithography and Reactive Ion Etching (LIRIE)

    Article • Microelectronic Engineering, February 1995, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  74. Lithography and Reactive Ion Etching in Microfabrication

    Article • January 1995, Springer Science + Business Media

    Dr, Dipl-Ing. Peter Hudek

  75. Transfer of single-layer positive resist sub-micrometer and nanometer structures into silicon

    Article • Microelectronic Engineering, May 1994, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  76. Submicro- and nanometer e-beam lithography and reactive ion etching with single layer chemically amplified negative resist

    Article • Microelectronic Engineering, January 1994, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  77. Photoelectrical properties of GaAs MSM photodetector compatible with pseudomorphic heterostructure MESFET

    Article • phys stat sol (a), December 1993, Wiley

    Dr, Dipl-Ing. Peter Hudek

  78. Single-layer resist for deep, micro- and nanometer structure transfer

    Article • Microelectronic Engineering, April 1993, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  79. Newly developed novolak-based resist materials for ion projection lithography (IPL) with structure dimensions of 200-100 nanometers

    Article • Microelectronic Engineering, April 1993, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  80. Experimental investigation of the resist heating effect in a variably shaped EBL system

    Article • Microelectronic Engineering, April 1993, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  81. GaAs MSM Photodiode Using the Highly Doped Channel Layer of a Heterostructure MESFET

    Article • phys stat sol (a), March 1993, Wiley

    Dr, Dipl-Ing. Peter Hudek

  82. Effect of Proton Bombardment on the Dark Current of GaAs MSM Structures

    Article • phys stat sol (a), September 1992, Wiley

    Dr, Dipl-Ing. Peter Hudek

  83. Sub-0.25-μm ion projection lithography (IPL) in PMMA- and novolak-based resist materials (RAY-PF, RAY-PN, SAL-603)

    Article • Microelectronic Engineering, March 1992, Elsevier

    Dr, Dipl-Ing. Peter Hudek

  84. Process optimization and diffusion length evaluation of a new aqueous base developable negative epoxy electron beam resist

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr Panagiotis Argitis, Dr, Dipl-Ing. Peter Hudek

  85. Characterization of laterally nanopatterned W/Si multilayers

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr. Matej Jergel, Dr, Dipl-Ing. Peter Hudek

  86. 12 GHz coplanar quasi-monolithic oscillator

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  87. Cathode sputtered permalloy films of high AMR effect and low coercivity

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  88. GaAs FET characterization in a quasi-monolithic Si environment

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  89. Novel plasma enhanced bulk micromachining process for MEMS

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek

  90. T-shaped gate based on poly Si/polyimide supported layers

    Article • Institute of Electrical & Electronics Engineers (IEEE)

    Dr, Dipl-Ing. Peter Hudek