All Stories

  1. So, You Want to Have a Nanofab? Shared-Use Nanofabrication and Characterization Facilities: Cost-of-Ownership, Toolset, Utilization, and Lessons Learned
  2. The Self-Report Delinquency Scale From the National Longitudinal Study of Adolescent to Adult Health Among At-Risk for Delinquency Youths
  3. The Self-Report Delinquency Scale From the National Longitudinal Study of Adolescent to Adult Health Among At-Risk for Delinquency Youths
  4. Nanoscale deformation in polymers revealed by single-molecule super-resolution localization–orientation microscopy
  5. Aligned carbon nanotube morphogenesis predicts physical properties of their polymer nanocomposites
  6. Nanoparticle Manufacturing – Heterogeneity through Processes to Products
  7. Research Update: Electron beam-based metrology after CMOS
  8. J. Alexander Liddle: Metrology at the nanoscale key to understanding of next generation lithography processes
  9. Molecular Precision at Micrometer Length Scales: Hierarchical Assembly of DNA–Protein Nanostructures
  10. Guiding the Self-Assembly of RecA Proteinfilaments on DNA Scaffolds to Create Rationally Designed Nanostructures
  11. Assessing fabrication tolerances for a multilevel 2D binary grating for 3D multifocus microscopy
  12. Nanomanufacturing: A Perspective
  13. Gravitational Sweep Sedimentation Velocity
  14. High-Resolution Imaging and Spectroscopy at High Pressure: A Novel Liquid Cell for the Transmission Electron Microscope
  15. Dielectric Characterization by Microwave Cavity Perturbation Corrected for Nonuniform Fields
  16. High-speed, high-purity separation of gold nanoparticle–DNA origami constructs using centrifugation
  17. Innenrücktitelbild: Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs (Angew. Chem. 4/2013)
  18. Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs
  19. Quantum-Dot Fluorescence Lifetime Engineering with DNA Origami Constructs
  20. DNA evolves
  21. Lithography, metrology and nanomanufacturing
  22. The innovator's non‐dilemma: the case of next‐generation lithography
  23. Available in print
  24. Soft X-Ray Microscopy of Nanomagnetism
  25. New Overlay Technique for Fabrication of 15nm Zone Plates
  26. EUV focus sensor: design and modeling
  27. Fabrication of platinum nanoparticles and nanowires by electron beam lithography (EBL) and nanoimprint lithography (NIL): comparison of ethylene hydrogenation kinetics
  28. Nonaqueous development of silsesquioxane electron beam resist
  29. Probe shape measurement in an electron beam lithography system
  30. Euv system optimization and advanced lithography research at Lawrence Berkeley National Laboratory
  31. Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning
  32. Mask-membrane impact on image blur in SCALPEL
  33. Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. format SCALPEL mask
  34. SCALPEL mask parametric study
  35. Thermomechanical modeling of the SCALPEL mask during exposure
  36. Global space charge effect in SCALPEL
  37. Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool
  38. Modeling of laminar e-beam source for SCALPEL
  39. Finite element modeling of SCALPEL masks
  40. Stress mapping techniques for the SCALPEL mask membrane system
  41. Space-charge results from the SCALPEL proof-of-concept system
  42. SCALPEL mask defect imaging analysis
  43. Analytical model of the “Shot Noise” effect in photoresist
  44. Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks
  45. Initial wafer heating analysis for a SCALPEL lithography system
  46. SCALPEL mask-membrane charging
  47. Pattern processing results and characteristics for SCALPEL masks
  48. Optimization of a SCALPEL® exposure tool using a diffractive image quality technique
  49. Equivalent modeling of SCALPEL mask membrane distortions
  50. Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
  51. Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis
  52. Metrology of scattering with angular limitation projection electron lithography masks
  53. Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
  54. Electron-beam lithography
  55. Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
  56. Error budget analysis of the SCALPEL(R) mask for sub-0.2 μm lithography
  57. Fracture Strength of Thin Ceramic Membranes
  58. High-throughput projection electron-beam lithography employing SCALPEL
  59. Transport in submicrometer buried mesotaxial cobalt silicide wires
  60. Choice of system parameters for projection electron-beam lithography: Accelerating voltage and demagnification factor
  61. Production of x-ray mask blanks for a point source stepper
  62. FABRICATION OF NANOSTRUCTURE ARRAYS USING PROJECTION ELECTRON-BEAM LITHOGRAPHY
  63. Sub-Micron Mesotaxial CoSi2 Wires
  64. Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique
  65. ALLOY CARBIDE PRECIPITATION IN A HIGH COBALT-NICKEL SECONDARY HARDENING STEEL