All Stories

  1. Hyperbranched Poly(Phenylene Sulfide) and Poly(Phenylene Sulfone): Polymerization of 3,5‐Dichlorobenzenethiol
  2. Polymer light scattering enhanced by light absorption as a basis for photonic devices
  3. Trisubstituted Triptycenes: Toward the Preparation of Three-Dimensional Dendrimers
  4. Soluble Unimolecular Polymer Nanoparticles by Crosslinking of Polyethylenimine with Isophthalaldehyde
  5. Self cleaning coatings
  6. Diffusion Coefficients from NMR Corroborate Properties of Polymers in Solution
  7. Investigation of a device for the controlled / sustained release of semiochemicals into streams.
  8. Testing the hypothesis that the odor of trout hatchlings attracts adults to spawning sites
  9. Are sharks repelled by the odor of dead sharks? The answer is yes!
  10. Polymer analysis by fluorescence excitation spectroscopy
  11. Direct Synthesis of Poly(arylmethyl Sulfone) Monodendrons
  12. Hyperbranched Poly(phenylene sulfide) and Poly(phenylene sulfone)
  13. PREPARATIVE LC AND NON-POROUS SILICA CHROMATOGRAPHY AS USEFUL TOOLS IN LARGE SCALE DENDRIMER SYNTHESIS
  14. Capillary electrochromatography with dendrimer coatings
  15. Synthesis and Photochemistry of Tertiary Amine Photobase Generators
  16. USING NPS CHROMATOGRAPHY TO MONITOR MESYLATION REACTIONS
  17. Pyrene-Labeled Poly(aryl ether) Monodendrons:  Synthesis, Characterization, Diffusion Coefficients, and Photophysical Studies
  18. An Efficient Synthesis of Poly(aryl ether) Monodendrons and Dendrimers Based on 3,5-Bis(Hydroxymethyl)phenol
  19. Weak Temperature Dependence of Electron Transfer Rates in Fixed-Distance Porphyrin-Quinone Model Systems
  20. The 1.4 and 248 nm radiation response of chemically amplified resists containing arylmethyl sulfone photoacid generators
  21. Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study
  22. Arylmethyl sulfones: A new class of photoacid generators
  23. Synthesis and evaluation of copolymers of (tert-butoxycarbonyloxy)styrene and (2-nitrobenzyl)styrene sulfonates: single-component chemically amplified deep-UV imaging materials
  24. Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2)
  25. Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide)
  26. Sensitivity enhancement of t-BOC based chemically amplified resists through optimization of process prebake conditions.
  27. Synthesis and characterization of poly[4-((tert-butoxycarbonyl)oxy)styrene-sulfone]