All Stories

  1. Monolayer doping of silicon-germanium alloys: A balancing act between phosphorus incorporation and strain relaxation

    Article • Journal of Applied Physics, July 2019, American Institute of Physics

    Professor Justin D Holmes, Gioele Mirabelli

  2. Exploring conductivity in ex-situ doped Si thin films as thickness approaches 5 nm

    Article • Journal of Applied Physics, June 2019, American Institute of Physics

    Gioele Mirabelli, Rong Lin